RESEARCH

Atomic/Molecular Layer Deposition (A/MLD) enables creating uniform, conformal thin films with precise thickness control at the monolayer level. The solid surface is exposed to the precursors; each of which adsorbs with the chemically reactive site's surface. The precursors are introduced onto the substrate simultaneously and are separated via inert gas purges to ensure avoiding interactions of supporting solvents with substrates. In addition, the deposition temperature is lowered in comparison to the chemical vapor deposition (CVD).